Sotabase

Career

· Staff Software Engineer, Google2016–
· Staff Engineer, Tech Lead Manager, Synopsys2013–2016
· Software Engineer, Storm8/TeamLava2011–2011
· Senior Member Of Technical Staff, VMWare2011–2013
· Staff Engineer, Synopsys2006–2011
· Intern Researcher, AMD2004–2006
· PhD in Engineering, MS in Electrical Engineering & Computer Science, Computer Aided Design, University of California, Berkeley
· BS, Automation, Electrical Engineering, University of Science and Technology of China

Publications (28)

Across Wafer Critical Dimension Uniformity Enhancement Through Lithography and Etch Process Sequence: Concept, Approach, Modeling, and Experiment
IEEE transactions on semiconductor manufacturing · 2007
24
cited
Comprehensive CD uniformity control across lithography and etch
SPIE Advanced Lithography · 2005
22
cited
Across-wafer CD uniformity control through lithography and etch process: experimental verification
SPIE Advanced Lithography · 2007
17
cited
Across-wafer CD uniformity enhancement through control of multizone PEB profiles
SPIE Advanced Lithography · 2004
16
cited
Analysis of OPC optical model accuracy with detailed scanner information
2008
12
cited
Optical bistability induced by spin-orbit coupling in the carbon-nanotube quantum dots.
2016
12
cited
One step forward from run-to-run critical dimension control: Across-wafer level critical dimension control through lithography and etch process
2008
11
cited
Modeling of mask thermal distortion and its dependency on pattern density
Photomask Japan · 2005
10
cited
Polarization aberration modeling via Jones matrix in the context of OPC
2007
10
cited
High-sensitivity optical Faraday magnetometry with intracavity electromagnetically induced transparency
2016
9
cited
Cavity-enhanced room-temperature high sensitivity optical Faraday magnetometry
2017
8
cited
Combined use of x-ray reflectometry and spectroscopic ellipsometry for characterization of thin film optical properties
2006
6
cited
Determining OPC target specifications electrically instead of geometrically
2007
6
cited
The impact of scanner model vectorization on optical proximity correction
2007
6
cited
Continuous process window modeling for process variation aware OPC and lithography verification
2008
5
cited
Scanner-characteristics-aware OPC modeling and correction
2007
5
cited
Efficient post-OPC lithography hotspot detection using a novel OPC correction and verification flow
2007
4
cited
Novel apodization and pellicle optical models for accurate optical proximity correction modeling at 45 and 32 nm
2007
3
cited
Process variation aware OPC modeling for leading edge technology nodes
2009
3
cited
Modeling of focus blur in the context of optical proximity correction
2008
2
cited
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Qiaolin Zhang | Researcher Profile | Sotabase | Sotabase